CHEMAT Technology, Inc. Has designed and manufactured a compact and easy-to-use spin-coater, Model KW-4A, for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool for your research facility. A two-stage spin process allows dispensing at low speeds and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coating and organic thin films.
2-Stage Spinning
Stage 1: 500-2, 500 rpm
2-18 Seconds
Stage 2: 1, 000-8, 000 rpm
3-60 Seconds.
Power
115 VAC, 60 Hz, 1 Amp
220 VAC, 50 Hz, 1 Amp Vacuum: > 2.1 CFM
Speed Stability: <1%.
Compact Size
Depth: 10.0 inch
Width: 8.5 inch
Height: 8.5 inch.
1 unit per carton
CHEMAT TECHNOLOGY, INC. Has designed and manufactured a compact and easy-to-use hotplate, Model KW-4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW-4A spin coater, KW-4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films.
Operation: Manual Load
Process Control: Program (For details see OMRAN operation manual)
Temperature fluctuation: 1C
Temperature uniformity: 3%
Temperature Range:
¡ª30C - 350C (KW-4AH-350)
¡ª30C - 600C (KW-4AH-600)
Substrate Size:
¡ª7.5 inch X 7.5 inch(KW-4AH-350)
¡ª5.8 inch X 5.8 inch(KW-4AH-600)
Inert gas purge (KW-4AH-600 only).
UV curing is a photochemical process by which monomers undergo curing (polymerization or cross inking) upon exposure to ultraviolet radiation. A specially formulated monomer will polymerize when exposed to ultraviolet radiation. This UV "curable" monomer includes a sensitizer which absorbs UV energy and initiates a polymerizing reaction in the monomer.
KW-4AUV is specially designed for curing photosensitive coatings and thin films. It equips two UV light sources with radiations at 365 nm and 245 nm. The coated substrates up to 6?in diameter will be rotated at 6 rpm to ensure uniform curing. The built-in interlock door to prevent the exposure of UV radiation gives safe operation.
In conjunction with the KW-4A spin coater, the system can be used to make various coatings and thin films via the photochemical process.
PC-controlled and Windows-based operation interface
Easily connected to a printer or other exterior devices via USB port
7'' touch screen display, full-color alphanumeric-capable graphical user interface(GUI)
Visualized real time speed graphic display
A virtually unlimited number of user-defined recipe programs
Stainless steel coating bowl (optional polyethylene coating bowl)
Optional auto-dispensing and nitrogen purge
Rigid mechanical design protects the coating solutions from contact of drive system
Leading resolution and repeatability standard of this industry
Free technical support for the life of product via phone, e-mail, and fax.
Technical specifications:
Size: 19 inch X 14 inch X 11 inch
Machine Weight: 19.0Kg
Power: 110/220 VAC, 50/60 Hz, 1 Amp
Vacuum: More than 2.1 CFM
40 process recipe programs on board
Spin speed: 0 to 5, 000 RPM
Spin resolution: 1RPM
Spin repeatability: 1RPM
1s resolution for step time(Max. Step time 9, 999s)
Spin speed acceleration: 0 to 30, 000 RPM/s unloaded
Substrate sizes: 10 mm to 200 mm round.
DipMaster 50 DIP Coater is a specially designed tool for performing the feasibility study of research & development in thin films and coatings from the experts in the DIP coating technology.
It is compact and light for easy setup in the laboratory: Fume hoods, glove boxes, magnetic stirrer, laminar airflow benches, etc. To be convenient to conduct experiment.
The maintenance-free feature comes from its ruggedness and simple design. The coater can be easily configured into a system to do a single solution coating or multiple solution coatings by the combination of the coater with the solution management modules.
Programmable microcomputer controlled: Immersion speed, submersion period, withdrawal speed
Touch screen interface
Multi-mode dipping
Vibration free immersion and withdrawal
Easy to use, affordable, desk-top
Compact: Easily configured with a glove box
Equipped with a magnetic substrate holder
Customized substrate holder for irregular substrates.
Least maintenance
CE certified
Voltage: 110V/8A, 220V/4A
Dimension: 15 cm x 30 cm x 35 cm
Net Weight: 5Kg
Withdrawal Speed: 8mm-200mm/minute
Withdrawal Distance: Up to 75mm
Substrate size: Up to 50mm X 50mm
Four different dipping modes
Dipping time: 0-999s.
