CHEMAT TECHNOLOGY, INC. Has designed and manufactured a compact and easy-to-use hotplate, Model KW-4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW-4A spin coater, KW-4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films. Operation: Manual Load Process Control: Program (For details see OMRAN operation manual) Temperature fluctuation: 1C Temperature uniformity: 3% Temperature Range: ¡ª30C - 350C (KW-4AH-350) ¡ª30C - 600C (KW-4AH-600) Substrate Size: ¡ª7.5 inch X 7.5 inch(KW-4AH-350) ¡ª5.8 inch X 5.8 inch(KW-4AH-600) Inert gas purge (KW-4AH-600 only).