Cluster Sputter: 1. A system suitable for automated production lines or development and research sites 2. Highly integrated technology and mechanism
Batch Sputter: A system suitable for research and development as various thin film deposition is possible
Inline System: 1.A system with excellent productivity as an inline type in which the deposition process is performed while the substrate moves. 2. Optimized for OLED lighting panel production
Cluster System: 1. OLED Panel and material development system 2. High-efficiency/high-life panel manufacturing system through evaporation/encapsulation process in the ultra-high vacuum area 3. Application of cleaning and out-gassing removal methods to secure high-efficiency/high-life
R&D System 1. Suitable system for OLED Panel R&D 2. Organic and inorganic deposition and encapsulation process at an efficient investment cost
Supplier: Sputtering system, oled evaporation system, inline sputter, cluster sputter, batch sputter
Vacuum inline sputtering machine Continuous magnetron sputtering coating production line is mainly used for pressure afterburner plate, glass, ceramics, shell phone, computer, pc, pet and other surface sputtering high-quality, multi-function metal film, electromagnetic shielding film anti-interference (emi) , reaction film, a composite film, a transparent conductive film (ito), an antireflection film (the ar), the reflection-increasing film. Having a high throughput continuous magnetron metal production, using the industry's most advanced production technology, which greatly improves the adhesion of the film and the workpiece, adhesion. Continuous automatic production line to ensure the consistency and stability of the product, the whole process without emissions, wastewater discharge, the product complies with european environmental law requirements. The basic characteristics and parameters ? horizontal line structure can be realized simultaneously coated on one side ? production efficiency, the fastest speeds of up to 1 min / beat ? modular design, easy maintenance ? plating process maturity, high yield ? dc magnetron sputtering cathodes may vary depending on customer requirements ? vacuum system consists of a mechanical pump, roots pumps, diffusion pumps (molecular pump) composition ? line body size may vary depending on customer requirements.
ITEM DESCRIPTION Gun Size 2~16inch (Magnetron Sputter Gun) Substrate Size ~ 200mm (option) Process Gas Ar,O2,N2 Deposition Direction Up or Downward Process Temp ~ 700 C Thickness Uniformity
DC magnetron sputter system.
