Laboratory equipments & instruments.
Laboratory spin coater and dip coater.
PC-controlled and Windows-based operation interface Easily connected to a printer or other exterior devices via USB port 7'' touch screen display, full-color alphanumeric-capable graphical user interface(GUI) Visualized real time speed graphic display A virtually unlimited number of user-defined recipe programs Stainless steel coating bowl (optional polyethylene coating bowl) Optional auto-dispensing and nitrogen purge Rigid mechanical design protects the coating solutions from contact of drive system Leading resolution and repeatability standard of this industry Free technical support for the life of product via phone, e-mail, and fax. Technical specifications: Size: 19 inch X 14 inch X 11 inch Machine Weight: 19.0Kg Power: 110/220 VAC, 50/60 Hz, 1 Amp Vacuum: More than 2.1 CFM 40 process recipe programs on board Spin speed: 0 to 5, 000 RPM Spin resolution: 1RPM Spin repeatability: 1RPM 1s resolution for step time(Max. Step time 9, 999s) Spin speed acceleration: 0 to 30, 000 RPM/s unloaded Substrate sizes: 10 mm to 200 mm round.
DipMaster 50 DIP Coater is a specially designed tool for performing the feasibility study of research & development in thin films and coatings from the experts in the DIP coating technology. It is compact and light for easy setup in the laboratory: Fume hoods, glove boxes, magnetic stirrer, laminar airflow benches, etc. To be convenient to conduct experiment. The maintenance-free feature comes from its ruggedness and simple design. The coater can be easily configured into a system to do a single solution coating or multiple solution coatings by the combination of the coater with the solution management modules. Programmable microcomputer controlled: Immersion speed, submersion period, withdrawal speed Touch screen interface Multi-mode dipping Vibration free immersion and withdrawal Easy to use, affordable, desk-top Compact: Easily configured with a glove box Equipped with a magnetic substrate holder Customized substrate holder for irregular substrates. Least maintenance CE certified Voltage: 110V/8A, 220V/4A Dimension: 15 cm x 30 cm x 35 cm Net Weight: 5Kg Withdrawal Speed: 8mm-200mm/minute Withdrawal Distance: Up to 75mm Substrate size: Up to 50mm X 50mm Four different dipping modes Dipping time: 0-999s.
CHEMAT Technology, Inc. Has designed and manufactured a compact and easy-to-use spin-coater, Model KW-4A, for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool for your research facility. A two-stage spin process allows dispensing at low speeds and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coating and organic thin films. 2-Stage Spinning Stage 1: 500-2, 500 rpm 2-18 Seconds Stage 2: 1, 000-8, 000 rpm 3-60 Seconds. Power 115 VAC, 60 Hz, 1 Amp 220 VAC, 50 Hz, 1 Amp Vacuum: > 2.1 CFM Speed Stability:
CHEMAT TECHNOLOGY, INC. Has designed and manufactured a compact and easy-to-use hotplate, Model KW-4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW-4A spin coater, KW-4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films. Operation: Manual Load Process Control: Program (For details see OMRAN operation manual) Temperature fluctuation: 1C Temperature uniformity: 3% Temperature Range: ¡ª30C - 350C (KW-4AH-350) ¡ª30C - 600C (KW-4AH-600) Substrate Size: ¡ª7.5 inch X 7.5 inch(KW-4AH-350) ¡ª5.8 inch X 5.8 inch(KW-4AH-600) Inert gas purge (KW-4AH-600 only).
UV curing is a photochemical process by which monomers undergo curing (polymerization or cross inking) upon exposure to ultraviolet radiation. A specially formulated monomer will polymerize when exposed to ultraviolet radiation. This UV "curable" monomer includes a sensitizer which absorbs UV energy and initiates a polymerizing reaction in the monomer. KW-4AUV is specially designed for curing photosensitive coatings and thin films. It equips two UV light sources with radiations at 365 nm and 245 nm. The coated substrates up to 6?in diameter will be rotated at 6 rpm to ensure uniform curing. The built-in interlock door to prevent the exposure of UV radiation gives safe operation. In conjunction with the KW-4A spin coater, the system can be used to make various coatings and thin films via the photochemical process.
