Indonesian steam coal Gcv 5, 300 kcal/kg (air dried basis) Total moisture(air receive basisar)= 35%rejection>37% Inherent moisture (adb) = 15%approx Volatile matter (adb)= 42%approx Ash content (adb)=5% Total sulfur (adb)=0.2 % Hgi =60approx Size 0-50 mm= 90 % If your coal needs are a match with our specs, please contact us to Take this matter further." Min.Order 30, 000/mt
Indonesian steam coal- gcv 5300 adb.
Steamed coal.
Rating 150# (10K) DHV Standard Application Plant Thermal Power plant, Cement equipments Application Dust coal, Chip, Cement
Applicable Plant 1. Thermal power plant (electric & environmental equipments) 2. Cement equipments. Application - Dust Coal (ash) - Cement Rating 150#, 300# (10K, 20K) Temperature - 100¡É ~ 500¡É
Applicable Plant 1. Thermal power plant equipments 2. Cement equipments Application - Dust coal - Chip - Cement Rating 150# (10K) Temperature - 100 ~ 500
Applicable Plant 1. Thermal power plant (electric & environmental equipments) 2. Cement equipments. Application - Dust Coal (ash) - Cement Rating 150#, 300# (10K, 20K) Temperature - 100¡É ~ 500¡É
Applicable Plant 1. Thermal power plant (electric & environmental equipments) 2. Cement equipments. Application - Dust Coal(ash) - Cement Rating 150#, 300# (10K, 20K) Temperature - 100¡É ~ 500¡É
Lpg 50% propane & 50% butane mix Minimum order 30, 000mt's x 12 months Cif asian port
Applicable Plant 1. Oil Plant 2. Thermal poqer plant 3. Boiler equipment. Application - Water - Oil - Air - Boiler Steam Rating 150#, 300# (10K, 20K) Temperature - 100¡É ~ 500¡É
Applicable Plant 1. Sewage treatment plant 2. Fresh water & thermal power plant (electric & environmental equipments) 3. Oil plant 4. Purification plant 5. Hydroelectric power plant Application - Water - Oil - Gas - Air - Powder - Chip - Boiler Steam Rating 150#, 300#, 600# (10K, 20K, 40K) Temperature ¤ý RTFE - 40¡É ~ 120¡É ¤ý METAL - 196¡É ~ 450¡É
It is the equipment to provide the electron beam vertically to the evaporate surface using the electron beam gun, and it is used in the process of optical multi-layer films This is the process micro electro mechanical system (MEMS) known as the electron beam evaporation process Physical Vapor Deposition (PVD) The deposition process is used to open the data in the source and send those data to the basal board and also to form thin films or coating. Because this is inexpensive regarding the material cost and exhibits rather low process risk, PVD process is the chemical vapor deposition generally used for metal eposition. The process applying the deposition of thin films conducts modification with various kinds of surfaces wanted by the industry in order to provide data to the electronic industry for semicon doctor growth, reflection needing properties to the aerospace, environment to the permeability optics, surface protection from the board corrosion, and also thermal and chemical barrier coating.
It is the equipment to provide the electron beam vertically to the evaporate surface using the electron beam gun, and it is used in the process of optical multi-layer films This is the process micro electro mechanical system (MEMS) known as the electron beam evaporation process Physical Vapor Deposition (PVD) The deposition process is used to open the data in the source and send those data to the basal board and also to form thin films or coating. Because this is inexpensive regarding the material cost and exhibits rather low process risk, PVD process is the chemical vapor deposition generally used for metal eposition. The process applying the deposition of thin films conducts modification with various kinds of surfaces wanted by the industry in order to provide data to the electronic industry for semicon doctor growth, reflection needing properties to the aerospace, environment to the permeability optics, surface protection from the board corrosion, and also thermal and chemical barrier coating.
Thermal reflective paint.
