Tantalum sputtering target tantalum- tungsten alloy target
Material: ro5200, ro5400, ro5252(ta-2.5w), ro5255(ta-10w)
Size:
Circular targets: Diameter 25mm up to 400mm x thickness 3mm up to 28mm
Rectangular targets:Thickness 1mm up to 12.7mm x width up to 600mm x length up to 2000mm
Purity: >=99.95% or 99.99%
Special requirements to be agreed on by the supplier and buyer of negotiation
Tantalum tube tantalum capillary tube tantalum tungsten alloy tube
Material: ro5200, ro5400, ro5252(ta-2.5w), ro5255(ta-10w)
Size: dia: ï?1.0-100mm x thick: 0.25-8.0mm x length: 200mm-8000mm
Standard: as per astm b521
Purity: >=99.95% or 99.99%
Tantalum wire, rodï¼?bar
Material: ro5200, ro5400, ro5252(ta-2.5w), ro5255(ta-10w)
Size: 0.5-120mm dia. X 1000-6000mm l
Purity: >=99.95% or 99.99%
Specification: astm b 365
Special requirements to be agreed on by the supplier and buyer of negotiation
Tantalum sheet, plate, foil, strip, target
Material: ro5200, ro5400, ro5252(ta-2.5w), ro5255(ta-10w)
Size: 0.025mm min. T x 1000mm w max. X 2000mm l max.
Purity: >=99.95% or 99.99%
Specification: astm b 708
Special requirements to be agreed on by the supplier and buyer of negotiation
Tantalum rod Tantalum bar
Material:RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Purity: >=99.95% or 99.99%
Available size:Ï?3mm-100mm
Standard: ASTM B 365-98
Application: tantalum parts processing used in the semiconductor industry, high temperature materials, anti-corrosion industry, electronic industry, etc
Main Item / Productï¼?titanium foil/titanium bar/Titanium tubetitanium fastener/Zirconium sheet/Zirconium tube/Zirconium bar/Tungsten plate/Tungsten Bar/Tungsten fastener/Molybdenum sheet/Molybdenum rods/molybdenum wire/Tantalum sheet/Tantalum strip/Tantalum rod/Tantalum wire/Tantalum tube/Niobium sheet/Niobium foil/Niobium tube/Niobium bar /Niobium wire/Cobalt wire/Cobalt rod/ Cobalt plate/Evaporation Pellets & Pieces/Crucibles/Pure metal and metal alloy sputtering target material
Tantalum Sputtering Targets
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 â??, and the density is 16.68g/cm³. Tantalum has a series of excellent properties, including high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and large dielectric constant of surface oxide film. Tantalum targets are mainly used in semiconductor coating, optical coating, flat panel displays, optical information storage space industries, glass coating industries such as automotive and architectural glass, optical communication, etc.
Tantalum Sputtering Targets are made from tantalum of the highest purity, ensuring a consistent and reliable composition. The high density of the material increases sputtering efficiency and improves film adhesion. The low content of impurities and gases in tantalum enables excellent film quality and uniformity. In addition, the material is easy to process and can be precisely molded to meet specific application requirements. Their adaptability and reliability make them an important part of many sputter deposition processes.
Highly resistant to heat and corrosion, our tantalum is essential in the electronics industry, particularly for capacitors and high-performance alloys. Its stability and reliability make it a critical component in medical devices and aerospace technology. Nested in the volcanic mountains and the highlands of the Eastern DRC and its southern region, we source tantalum from ethical mines meeting our highest standard of compliance
