Lithographic photomasks are typically transparent glass templates covered with chrome patterns. They are designed to optically transfer patterns to wafers or other substrates in microfabrication. Depending on the difference of the substrates, bonda tech fabricates three types of photomasks: quartz masks, soda lime masks and mylar masks. The attainable critical dimensions (cd, i.E. Minimum feature sizes) for these three types of masks are 0.75, 1.5, and 25 micrometers, respectively. Typical mask dimensions are 3"x3", 4"x4", 5"x5", 6"x6" and 7"x7". These photomasks are either direct-written by e-beam or laser systems or are manufactured from reticles using photo repeater system. Bonda tech fabricates three types of photomasks: quartz masks, soda lime masks and mylar masks.