.Inspection and checking elligibility of imported food to Japan
Solar Cell Manufacturing Plant in excellent condition Equipment overview Photovoltaic cell manufacturing equipment Single crystal type, cell size 156.3 �? 156.3 (M Manufacturing capacity 80 MW / year Elapsed years after facility introduction January 2011 mass production operation 2. Equipment owned (attached with detailed list) (1) Production facility Cleaning device Damage layer etching apparatus Texture etching equipment Phosphor glass etching equipment: 2 units (There are 2 lines on No. 6 line) Oxide film removal equipment Diffusion furnace, thermal oxidation furnace: 10 units (6 units for diffusion, 4 units for thermal oxidation) Plasma CVD apparatus: Three (2 TB type, MCXS type, but no vacuum pump) Printing drying furnace: 3 units (2 units for electrode printing, 1 unit for dopant printing) Printing drying Firing furnace: 1 unit Printing machine: 6 units (2 electrode printing: 2 units, 1 electrode printing: 2 units, dopant printing: 1 unit) IV inspection machine: 3 units (1 unit for half cut, 1 unit for full size, 1 unit for remeasurement) Wafer distributor (with inspection device.Wafer thickness, dimensions, etc.) Various conveying devices (some control parts are taken, operation can not be guaranteed) Laminator: 4 (NPC made 2 units, Nisshinbo made 2 units) Plasma etching equipment (not subject to sale as it is sold to manufacturers) (2) Inspection machine, measuring instrument Sheet resistance measuring instrument: 2 units Reflectance measuring device: 2 units Ellipsometer: 2 units (3) Other equipment / jig Printing mask cleaning device: 1 unit Tube washer (quartz parts wash): 1 unit Jigs such as each carrier, quartz boat, stack jig CVD exhaust gas burn-off device
