Sputtering targets.
Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.. The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating. In the field of Rotatable Target, Kewei first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers: Planar target: single weight: 260kg, purity: 99.97% Rotatable target: OD:140-180mm;ID: 125-135mm. length 3300mm ,purity: 99.97%
Ti-Al Target Cr Rotating Target Si-Al Rotating Target;Product maximum size of Ï?500 * 2000, grain size â?¤100μm, density â?¥98%, purity â?¥99.5%. Silicon Target Cr-Al Target Titanium Aluminum Alloy Targets ZrO2 Target;Purity (%) Density (g/cm3) Shape & Size 99.9 5.56 Circular Φ18~30x7~18mm Sector Plate TiO2 Target; Purity(%) Density(g/cm3) Shape & Size 99.9 4.24 Circular Ф50~90x8~12mm Ta2O5 Targets SiO2 Target;Purity(%) Density (g/cm3) Shape & Size 99.9 2.21 Circular Φ18~30x7~18mm Ring Φ230~350x5~20mm Plate MgO Target;Purity(%) Density(g/cm3) Shape & Size 99.9 3.58 Circular Ф50~90x8~12mm Al2O3 Target; Purity(%) Density(g/cm3) Shape & Size 99.99 3.99 Circular Ф50~90x8~12mm
China Manufacturer with main products:tungsten crucible ,tungsten rod ,tungsten plate/sheet ,tungsten tube ,tungsten heating elements ,tungsten wire ,molybdenum crucible ,molybdenum rod ,molybdenum plate/sheet ,molybdenum tube ,molybdenum electrode ,alloy products. contact Tina
The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured. Complementing our advanced thermal spray capability, Able Target Limited have developed proprietary casting capability to manufacture select rotatable sputtering targets to meet high density and high purity specifications. Rotary Sputtering Target Relative density: >99% Purity: >99.5%â?¥99.999% Rotary sputtering target size: Ï?56~190mm L: 120~5000 mm Our Rotary Sputtering target materials including : ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.
The planar sputtering target is connected to the sputtering device by means of a smattering method, and the film is deposited on the substrate under vacuum conditions, and then passed through the substrate. Various means (etching) are applied to the film to meet different needs. Our company produces Flat planar Sputtering targets for various models and applications, including tool coatings, decorative coatings, functional coatings, multi-Arc sputtering and more. According to different customer requirements, we can provide drawings and usage suggestions, and tailor the appropriate targets for customers. Planar target size range: Rectangular Shape: (30~4000)*(20~4000)*(4~25)mm Round Shape: Diameter 500mm*50mm thick Purity range: 99.5%~99.9%, 99.95%, 99.99%, 99.999%, 99.9999% Technology accumulation A variety of production techniques and equipment (cold isostatic pressing + various atmosphere sintering technology, spraying technology, low temperature metal / alloy centrifugal casting technology, vacuum hot pressing sintering technology, hot isostatic sintering technology, electron beam melting / regional melting Purification technology, etc.) Product diversity Customized service of the product Waste target recycling and reuse technology Self-owned intellectual property target bonding Thin film layer design and material application design Powder material synthesis technology Ultrafine powder dispersion and dispersion technology DCC and CIP material forming technology Various types of atmosphere protection and sintering technology Metal and ceramic friction welding technology Centrifugal casting and precision metal alloy processing Plasma spray material manufacturing and surface treatment technology
Tantalum sputtering target antalum- tungsten Alloy target Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) Size: circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm rectangular targets:Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm Purity: >=99.95% or 99.99% Special requirements to be agreed on by the supplier and buyer of negotiation Baoji Lihua Non-ferrous Metals Co., Ltd. is specialized in Tantalum (Ta) and its alloy(Ta-2.5W RO5252, Ta-10W RO5255) plate, sheet, foil, strip, target, tape, rod, bar, wire, tube and pipe according to ASTM specifications. The materials are available as RO5200, RO5252, RO5255. standard export packing suitable for long distance international transportation.
Niobium sputtering target, niobium evaporation material Material: 99.95% Size: Circular targets: diameter 25mm up to 400mm x thickness 3mm up to 28mm Rectangular targets: thickness 1mm up to 12.7mm x width up to 600mm x length up to 2000mm Purity: >=99.95% Special requirements to be agreed on by the supplier and buyer of negotiation Baoji lihua non-ferrous metals co., ltd. Is specialized in niobium (nb) and its alloy(nb1%zr) plate, sheet, foil, strip, target, tape, rod, bar, wire, tube and pipe according to astm specifications. The materials are available as ro4200, ro4210, r4261 (nb1%zr) Standard export packing suitalbe for long distance international transportation
Tantalum sputtering target antalum- tungsten Alloy target Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) Size: circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm rectangular targets:Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm Purity: >=99.95% or 99.99% Special requirements to be agreed on by the supplier and buyer of negotiation Baoji Lihua Non-ferrous Metals Co., Ltd. is specialized in Tantalum (Ta) and its alloy(Ta-2.5W RO5252, Ta-10W RO5255) plate, sheet, foil, strip, target, tape, rod, bar, wire, tube and pipe according to ASTM specifications. The materials are available as RO5200, RO5252, RO5255. standard export packing suitable for long distance international transportation.
Niobium sputtering target, niobium evaporation material Material: 99.95% Size: Circular targets: diameter 25mm up to 400mm x thickness 3mm up to 28mm Rectangular targets: thickness 1mm up to 12.7mm x width up to 600mm x length up to 2000mm Purity: >=99.95% Special requirements to be agreed on by the supplier and buyer of negotiation Baoji lihua non-ferrous metals co., ltd. Is specialized in niobium (nb) and its alloy(nb1%zr) plate, sheet, foil, strip, target, tape, rod, bar, wire, tube and pipe according to astm specifications. The materials are available as ro4200, ro4210, r4261 (nb1%zr) Standard export packing suitalbe for long distance international transportation
Tungsten sputtering target.
Molybdenum sputtering target Purity Mo,99.95%min General size Diameter( 1mm ) Length(
ITO target-ceramic target-sputtering target Purity 99.99%min,In2O3/SnO2=90/10wt% or In2O3/SnO2=90/10wt% General size Diameter( 1mm ) Length(
GaCu alloy sputtering target Purity GaCu,99.6%~99.98% General size Diameter( 1mm ) Length(
Ceramic sputtering target Ceramic Sputtering Targets : Boride Sputtering Targets Cr2B,CrB,CrB2,Cr5B3, FeB,HfB2,LaB6,Mo2B,Mo2B5,NbB,NbB2,TaB,TaB2,TiB2,W2B,WB,VB,VB2,ZrB2 Carbide Sputtering Targets : B4C,Cr3C2,HfC,Mo2C,NbC,SiC,TaC,TiC,WC,W2C,VC,ZrC Fluoride Sputtering Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3 Nitrides Sputtering Targets : AlN, BN,GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Oxide Sputtering targets : Al2O3,Sb2O3,ATO,BaTiO3,Bi2O3,CeO2,CuO,Cr2O3 ,Dy2O3,Er2O3,Eu2O3,Gd2O3,Ga2O3,GeO2,HfO2 ,Ho2O3,In2O3,ITO,Fe2O3,Fe3O4,La2O3,PbTiO3,PbZrO3,LiNbO3,Lu3Fe5O12,Lu2O3,MgO,MoO3,Nd2O3,Pr6O11,Pr(TiO2)2,Pr2O3,Sm2O3,Sc2O3,SiO2,SiO,SrTiO3,SrZrO3,Ta2O5,Tb4O7,TeO2,ThO2,Tm2O3,TiO2,TiO,Ti3O5,Ti2O3,SnO2,SnO,WO3,V2O5,YAG, Y3Al5O12,Yb2O3,Y2O3,ZnO,ZnO:Al,ZrO2(unstabilized),ZrO2-5-15wt%CaO) Selenides Sputtering Targets : Bi2Se3,CdSe,In2Se3,PbSe,MoSe2,NbSe2,TaSe2,WSe2,ZnSe Silicides Sputtering Targets : Cr3Si,CrSi2,CoSi2, HfSi2,MoSi2,NbSi2,TaSi2,Ta5Si3,TiSi2,Ti5Si3,WSi2,V3Si,VSi2,ZrSi2 Sulfides Sputtering Targets : Sb2S3 ,As2S3,CdS,FeS,PbS,MoS2,NbS1.75,TaS2,WS2,ZnS, Tellurides Sputtering Targets : CdTe,PbTe,MoTe2,NbTe2,TaTe2,WTe2,ZnTe Other : Cr-SiO ,GaAs , Ga-P, In-Sb , InAs, InP, InSn, other target show as below: superconducting thin film, protective film. Metal Sputtering Targets (include Rare Earth metal Sputtering Target): Al,Sb,Bi ,B ,Cd ,C,Ce ,Cr ,Co ,Cu ,Dy,Er,Eu,Gd,Ge ,Au ,C,Hf,Ho,In ,Ir ,Fe ,La,Lu ,Mg,Mn,Mo ,Nd,Ni,Nb,Pd,Pt ,Pr,Re ,Ru ,Sm,Se ,Sc,Ag,Si ,Ta,Tb,Tm,Sn,Ti,W,V ,Yb,Y,Zr,Zn,La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu , Sc, Y Alloy Sputtering Targets: AlCu,AlCr,AlMg,AlSi,AlSiCu, AlAg,AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd,CeSm,CrSi,CoCr, CoCrMo, CoFe,CoFeB,CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo ,CuGa,CuIn,CuNi,CoNiPt, CuZr,DyFe, DyFeCo, FeB,FeC,FeMn,GdFe, GdFeCo, HfFe,IrMn,IrRe,InSn,MoSi,NiAl,NiCr,NiCrSi,NdDyFeCo, NiFe,NiMn, NiNbTi ,NiTi,NiV,SmCo, AgCu,AgSn,TaAl,TbDyFe,TbFe,TbFeCo, TbGdFeCo, TiAl,TiNi,TiCr,WRe ,WTi,WCu, ZrAl,ZrCu, ZrFe ,ZrNb,ZrNi,ZrTi,ZrY ,ZnAl,ZnMg Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%. Shape: foil, sheet, rod, pipe, tube, ring, wafer, plate, tablet and base on your drawing. disk, rectangle, band, rod and other shapes Dimension: Diameter (
Coating industry: As sputtering target, products can be used in decorative coating and functional coating industry. As coating materials, Zirconium coatings has excellent corrosion resistance. It can also form carbide and nitride ceramics with carbon, nitrogen and other elements, and can form a variety of colors, with excellent decoration and corrosion resistance. It has been widely used in consumer electronics, bathroom, Glass coating industry; Chemical Industry: Because zirconium has better acid and alkali resistance than titanium, it is more and more used in the chemical industry, such as acetic acid chemical pipelines, pumps and valves, etc.
Amorphous alloy, as a special material with short-range disorder and long-range order and unique amorphous structure, its comprehensive performance is obviously better than that of traditional materials. The material has the characteristics of high strength, high hardness and high corrosion resistance. It has been applied in the fields of military industry, traditional industry, sports equipment, medical equipment, electronic products, etc.
Below is our main products: (1)Sputtering targets Such as: CIGS,In2Se3,MoNb,MoS2;CdS;CdTe;SiAl(90-10);TiOx;Nb2Ox;ZnS;WTi;TiN;ZrB2;NaF; TaSi2;MoSi2;ATO (90-10);LaB6;Al2O3;Y2O3 , AlNd; NiV; NiCr; AlSi and so on (2)Rare Earth Product: Such as: distilled Tb,Dy,Ho,Er,Tm,Yb,Lu,Sc and DyF3; YbF3;YF3 and so on (3)Semiconductor Compound material: Such as CIGS; As2S3;CdS; As2Te3;ZnTe; Bi2Te3;PbSe; Sb2Se3; InSb;GeTeSb;GeTe and so on (4)Special alloys Such as: AlSc(2wt%); AlNd(2wt%);YMg; HoCu and so on
Place of Origin: Shaanxi, China (Mainland) Brand Name: JT Model Number: JT-Niobium Application: Industry grass industry semiconductor Shape: pellet round planar rotatable target Material: Niobium Dimensions: 10-100mm Chemical Composition: 99.95%Min Product Name: factory supply 99.95% niobium sputtering tube target Material: Niobium 99.95% Grade: Nb1 NbZr10 R04200 R04210 Shape: plate bar rod wire tube pipe Type: round target,tube target,sheet target Certificate: ISO9001:2008 Standard: ASTM B392 ASTM B393 ASTM B394
Specifications Titanium silver alloy target; 1.Light surface 2.No spot, no hole 3.The fineness of surface reach ra1.6. 4.Timely Titanium silver alloy target: 1.Product type:titanium silver alloy 2.Origin:home-grown 3.Content:al contentâ?¥1%-99%:impyrity content:0.01% 4.Alloy composition:ag1wt%-99wt% as the customer's requirement. Composition deviation:â?¤â±1% density:â?¥99% 5.Material purity:ag+ti=99.99%-99.999% 6.Supply specification:within 200x300x20mm and as the customer's requirement. 7.Usage:vacuum sputtering target 8.Announcements:gentle with handle, do not touch so that the surface is not glossy and do not press so that the deformation. If any item you like, or any suggestion you have, please contact usï¼?your sincere inquiries are typically answered within 24 hours.
