Gacu Alloy Sputtering Target

Vacuum Components and alloy target for sputtering: We supply efficient and reliable Sputtering Cathode and Alloy Target, organic and inorganic evaporation source and related parts, which are self-made products.

Pure metal and metal alloy sputtering target material list Sputtering target materials are widely applied in electronics and information industry, such as integrated circuit, information storage, LCD screen, laser storage and electronic control devices, etc;Can also be applied to glass coating field;Can also be applied to wear, high temperature and corrosion resistant, high grade decoration products and other industries. classification According to the shape can be divided into long target, target, round target, the target According to the composition can be divided into a metal target materials, alloy material, ceramic compound material Main Item / Productï¼?titanium foil/titanium bar/Titanium tubetitanium fastener/Zirconium sheet/Zirconium tube/Zirconium bar/Tungsten plate/Tungsten Bar/Tungsten fastener/Molybdenum sheet/Molybdenum rods/molybdenum wire/Tantalum sheet/Tantalum strip/Tantalum rod/Tantalum wire/Tantalum tube/Niobium sheet/Niobium foil/Niobium tube/Niobium bar /Niobium wire/Cobalt wire/Cobalt rod/ Cobalt plate/Evaporation Pellets & Pieces/Crucibles/Pure metal and metal alloy sputtering target material

Pure metal and metal alloy sputtering target material list Sputtering target materials are widely applied in electronics and information industry, such as integrated circuit, information storage, LCD screen, laser storage and electronic control devices, etc;Can also be applied to glass coating field;Can also be applied to wear, high temperature and corrosion resistant, high grade decoration products and other industries. classification According to the shape can be divided into long target, target, round target, the target According to the composition can be divided into a metal target materials, alloy material, ceramic compound material Main Item / Productï¼?titanium foil/titanium bar/Titanium tubetitanium fastener/Zirconium sheet/Zirconium tube/Zirconium bar/Tungsten plate/Tungsten Bar/Tungsten fastener/Molybdenum sheet/Molybdenum rods/molybdenum wire/Tantalum sheet/Tantalum strip/Tantalum rod/Tantalum wire/Tantalum tube/Niobium sheet/Niobium foil/Niobium tube/Niobium bar /Niobium wire/Cobalt wire/Cobalt rod/ Cobalt plate/Evaporation Pellets & Pieces/Crucibles/Pure metal and metal alloy sputtering target material

Sputtering targets.

Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.. The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating. In the field of Rotatable Target, Kewei first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers: Planar target: single weight: 260kg, purity: 99.97% Rotatable target: OD:140-180mm;ID: 125-135mm. length 3300mm ,purity: 99.97%

Ti-Al Target Cr Rotating Target Si-Al Rotating Target;Product maximum size of Ï?500 * 2000, grain size â?¤100μm, density â?¥98%, purity â?¥99.5%. Silicon Target Cr-Al Target Titanium Aluminum Alloy Targets ZrO2 Target;Purity (%) Density (g/cm3) Shape & Size 99.9 5.56 Circular Φ18~30x7~18mm Sector Plate TiO2 Target; Purity(%) Density(g/cm3) Shape & Size 99.9 4.24 Circular Ф50~90x8~12mm Ta2O5 Targets SiO2 Target;Purity(%) Density (g/cm3) Shape & Size 99.9 2.21 Circular Φ18~30x7~18mm Ring Φ230~350x5~20mm Plate MgO Target;Purity(%) Density(g/cm3) Shape & Size 99.9 3.58 Circular Ф50~90x8~12mm Al2O3 Target; Purity(%) Density(g/cm3) Shape & Size 99.99 3.99 Circular Ф50~90x8~12mm

Titanium available grades for titanium target: Commercially pure (grade 1-grade 2) Ti6al4v (grade 5) Ti/al alloy ti: al 75:25 at%, 65:35 at%; 50:50 at%; 35:65 at% Ti/cr alloy Ti/ni alloy Ti/si alloy Ti/zr alloy Other grade and alloy by request Surface: Precisely machined / ground, shinny bright surface Roughness: ra 1.6, 0.8 by request Forms for titanium target: Planar/ circular / / tubular Custom-made form as per drawing Purity: 99 - 99.999% Target shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored. To provide specifications of aluminum target supporter, mammography supporter, copper target supporter, titanium target supporter. Target metallization services Target bonding services.

China Manufacturer with main products:tungsten crucible ,tungsten rod ,tungsten plate/sheet ,tungsten tube ,tungsten heating elements ,tungsten wire ,molybdenum crucible ,molybdenum rod ,molybdenum plate/sheet ,molybdenum tube ,molybdenum electrode ,alloy products. contact Tina

The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured. Complementing our advanced thermal spray capability, Able Target Limited have developed proprietary casting capability to manufacture select rotatable sputtering targets to meet high density and high purity specifications. Rotary Sputtering Target Relative density: >99% Purity: >99.5%â?¥99.999% Rotary sputtering target size: Ï?56~190mm L: 120~5000 mm Our Rotary Sputtering target materials including : ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.