Ito Sputtering Target

The same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time Advantages quality 1. Reliability, price 2.Vacuum melting, purification and preparation of high purity, less impurity 3.Dense, rolling, oxidation, forming plasticizers 4.Relatively high density, grain uniformity axis, consistency Product accessories Formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice Packing vacuum Packaging / vacuum neutral packing / special packaging outside reinforcement package Mode of transport for Domestic express carrier (sf, shen tong, ems, nadu --- safe, fast and reliable) Packaging / vacuum neutral packing / special packaging outside reinforcement package

By hot isostatic pressing, ITO target density is high Relative density more than 99% Target purity is 99.99%. Widely used in flat panel display coating Vacuum package; wooden case; have a quality certificate report.

Sputtering targets.

Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.. The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating. In the field of Rotatable Target, Kewei first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers: Planar target: single weight: 260kg, purity: 99.97% Rotatable target: OD:140-180mm;ID: 125-135mm. length 3300mm ,purity: 99.97%

Ti-Al Target Cr Rotating Target Si-Al Rotating Target;Product maximum size of Ï?500 * 2000, grain size â?¤100μm, density â?¥98%, purity â?¥99.5%. Silicon Target Cr-Al Target Titanium Aluminum Alloy Targets ZrO2 Target;Purity (%) Density (g/cm3) Shape & Size 99.9 5.56 Circular Φ18~30x7~18mm Sector Plate TiO2 Target; Purity(%) Density(g/cm3) Shape & Size 99.9 4.24 Circular Ф50~90x8~12mm Ta2O5 Targets SiO2 Target;Purity(%) Density (g/cm3) Shape & Size 99.9 2.21 Circular Φ18~30x7~18mm Ring Φ230~350x5~20mm Plate MgO Target;Purity(%) Density(g/cm3) Shape & Size 99.9 3.58 Circular Ф50~90x8~12mm Al2O3 Target; Purity(%) Density(g/cm3) Shape & Size 99.99 3.99 Circular Ф50~90x8~12mm

Titanium available grades for titanium target: Commercially pure (grade 1-grade 2) Ti6al4v (grade 5) Ti/al alloy ti: al 75:25 at%, 65:35 at%; 50:50 at%; 35:65 at% Ti/cr alloy Ti/ni alloy Ti/si alloy Ti/zr alloy Other grade and alloy by request Surface: Precisely machined / ground, shinny bright surface Roughness: ra 1.6, 0.8 by request Forms for titanium target: Planar/ circular / / tubular Custom-made form as per drawing Purity: 99 - 99.999% Target shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored. To provide specifications of aluminum target supporter, mammography supporter, copper target supporter, titanium target supporter. Target metallization services Target bonding services.

Magnetron Sputtering Deposition Line for ITO Glass The machine line uses two industrial computers and PLC systems to dynamically display the whole operation process with alarm and self-protective functions. The important processing parameters with several optical inspected systems connected to the computer, so the color and thickness of the film can be automatically controlled. ITO Glass coating line: This machine are available to metalize transparent electric conductive film on glass, for example, LCD, PDP display or OLED display, etc. Using vacuum magnetron sputtering deposition technology, with dual cathodes, MF sputtering technology and international advanced control system, it is to deposit SiO2/ITO on the float glass. All the process is automatically controlled in series.

China Manufacturer with main products:tungsten crucible ,tungsten rod ,tungsten plate/sheet ,tungsten tube ,tungsten heating elements ,tungsten wire ,molybdenum crucible ,molybdenum rod ,molybdenum plate/sheet ,molybdenum tube ,molybdenum electrode ,alloy products. contact Tina

The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured. Complementing our advanced thermal spray capability, Able Target Limited have developed proprietary casting capability to manufacture select rotatable sputtering targets to meet high density and high purity specifications. Rotary Sputtering Target Relative density: >99% Purity: >99.5%â?¥99.999% Rotary sputtering target size: Ï?56~190mm L: 120~5000 mm Our Rotary Sputtering target materials including : ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.