Magnetron Sputtering Coaters

Magnetron sputtering coaters http://www.pvd-metallizer.com Magnetron sputtering vacuum coater is an updated sputtering coating technique with advantages of high sputtering speed, lower temperature, stable performance and simple manipulation, etc. By this equipment, the metallic film, iridescent film, golden film can be coated with sputtering evaporation on the metals, pre-treated plastic, glass, mica and ceramic products. Just using different targets with reactive gas inflation can realize different films.

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time. In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.

Magnetron sputtering web coater http://www.pvd-metallizer.com High vacuum web coater is specially designed equipment for coating aluminium films or oxidant compound films or other metallic films on rolls of any polyester membranes. It can be also equipped with both wire-feeding system, MF melting pot, DC or MF sputtering metallization function as per customers specific requirements to realize certain coating purposes.

The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film. This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film. The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.

Three targets DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 500W DC power supply. The DC power supply can be used for the preparation of metal film. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications. The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Sputter coater for car hubcap metalizing http://www.pvd-metallizer.com High vacuum magnetron sputtering coater is specially designed for automobile & motorcycle hubcap coating or metallizing with unique features and special structure designed, enabling to meet the needs of all the technical demands. Equipped with cryo-pump (Poly-Cold), it can realize very high coating efficiency. With specially designed cathodes structure to realize sputtering high ratio, it can accomplish each coating cycle within 8~12 minutes under computer & PLC control. The substrate rack driving system with both revolution and rotation functions plus substrate self-rotation, is able to ensure the coating evenness and uniformity.

Supplier: Sputtering coater, E-beam optical coater, cathodic arc pvd coater, magnetron sputtering coating line for low-e or ito glass, hubcap sputtering coater, wire-feeding web coater, sputtering web coater, thermal evaporation coater, vacuum pumps

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